A new vacuum-etched high-transmittance (antireflection) film
- 1 May 1980
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 36 (9) , 727-729
- https://doi.org/10.1063/1.91647
Abstract
Films of high optical transmittance have been formed by the reactive sputter etching of quartz slides. With a globular metal masking layer, conical structures are formed in the quartz which form a gradient‐index film. To date films have been produced which have less than half the loss of an uncoated quartz surface over a 2:1 wavelength range. Film scattering limits the short‐wavelength performance and is shown to depend on the film structure’s average period.Keywords
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