Vapor−Liquid Hybrid Deposition Process for Device-Quality Metal Oxide Film Growth
- 14 October 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 15 (22) , 4157-4159
- https://doi.org/10.1021/cm034437s
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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