Microstructure evolution of hydrogenated silicon thin films at different hydrogen incorporation
- 1 April 1997
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 113-114, 741-749
- https://doi.org/10.1016/s0169-4332(96)00883-5
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Microstructure evolution of hydrogenated silicon thin filmsProgress In Photovoltaics, 1996
- Structural and Electrical Properties of n-Type Poly-Si Films Prepared by Layer-by-Layer TechniqueJapanese Journal of Applied Physics, 1993
- Vibrational Spectra of Hydrogen in Silicon and GermaniumPhysica Status Solidi (b), 1983
- Dopant segregation in polycrystalline siliconJournal of Applied Physics, 1980
- Phosphorus Doping of Low Pressure Chemically Vapor‐Deposited Silicon FilmsJournal of the Electrochemical Society, 1979
- Transport properties of polycrystalline silicon filmsJournal of Applied Physics, 1978
- The electrical properties of polycrystalline silicon filmsJournal of Applied Physics, 1975