Reactive ion etching of RuO2 thin films using the gas mixture O2/CF3CFH2

• 1 November 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (6) , 3208-3213
• https://doi.org/10.1116/1.587501

Abstract