Mechanical Properties of TiN Films with Preferred Orientation by Nano-Indentation Method.

1 January 1999

journal article
Published by Society of Materials Science, Japan in Journal of the Society of Materials Science, Japan

Vol. 48 (12) , 1423-1427
https://doi.org/10.2472/jsms.48.1423

Abstract

TiN films with the (111) and (200) preferred orientations were formed on Si(100) and sapphire (0001) substrates by ion-beam-assisted deposition. In order to clarify the relationship between the preferred orientation of the TiN films and the mechanical properties of the hardness H and the elastic moduli E^*, nano-indentation studies with a Berkovich indenter were carried out. Their experiments revealed significant differences in H and E^* irrespective of substrate materials; i.e., H_av=9GPa, E^*_av=192GPa for the (111) preferred orientation and H_av=16GPa, E^*_av=316GPa for the (200) preferred orientation. It could be considered that these differences were attributed to the intrinsic crystallographic anisotropy in a TiN crystal.

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