Surface morphology and growth mechanism of YBa2Cu3O7−y films by metalorganic chemical vapor deposition using liquid sources
- 5 August 1996
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 69 (6) , 845-847
- https://doi.org/10.1063/1.117911
Abstract
We have investigated surface morphology of YBa2Cu3O7−y thin films prepared by chemical vapor deposition (CVD) using liquid metalorganic (MO) sources on MgO(100) single crystalline substrates by atomic force microscopy (AFM). An abrupt change in the terrace width was observed at the deposition temperature of around 750 °C. An anomalous decrease in the efficiency of incorporation of the yttrium component into the film was also found above the same temperature. It suggests that the appearance of liquid phase on the growing surface and the growth mode change from the conventional vapor growth to the VLS (vapor–liquid–solid) growth mode at this temperature.Keywords
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