Baffle-free refractory dimer arsenic source for molecular-beam epitaxy

• 1 November 1988
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 6  (6) , 1667-1670
• https://doi.org/10.1116/1.584427

Abstract

Keywords

• ARSENIC
• MOLECULAR BEAM EPITAXY