Reactive Ion Etching of Silicon and Silicides in SF 6 or NF 3 / CCl4 or HCl Mixtures
- 1 August 1985
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 132 (8) , 1969-1973
- https://doi.org/10.1149/1.2114263
Abstract
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