Properties of Amorphous PbTiO3 Prepared by a Sputtering Deposition

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Abstract
Amorphous PbTiO3 films were prepared by a sputtering deposition. The film deposited on a substrate at 200°C was amorphous. The amorphous PbTiO3 changed to perovskite PbTiO3 when it was annealed above the crystallization temperature (520°C). When the amorphous PbTiO3 was annealed below the crystallization temperature, it partially crystallized and contained pyrochjore and perovskite crystallites. It is considered that the perovskite PbTiO3 crystallites, which grow in the sputtering-deposited amorphous PbTiO3 film, are in a “stress-free state” below the crystallization temperature.

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