Polymer design for 157-nm chemically amplified resists

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Abstract
Based on UV measurements at 157nm of in-house fluoropolymers we have selected (alpha) -trifluoromethylacrylate and norbornene bearing a pendant hexafluoroisopropanol group as our building blocks for 157nm resist polymers. Polymers consisting of these repeat units have an optical density/micrometers of 3 or below at 157nm. We have found that the (alpha) -trifluoromethylacrylate derivatives conveniently undergo radical copolymerization with norornenes, which has provided a breakthrough in preparation of our 157nm resist polymers. This approach offers flexibility and versatility because an acidic moiety or acid-labile group can be placed in either acrylate or norbornene repeat unit. Other platforms of interest include all acrylic, all-norbornene, and acrylic-styrenic polymers.

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