Stress in thin dielectric films
- 1 December 1963
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 2 (3) , 207-213
- https://doi.org/10.1016/0026-2714(63)90006-4
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- The development of stress and surface temperature during deposition of lithium fluoride filmsPhilosophical Magazine, 1963
- Dielectric Anomaly in ZnS FilmsJournal of Applied Physics, 1962
- Apparatus for the Measurement of Stress in Vacuum Evaporated FilmsReview of Scientific Instruments, 1961
- Stress Anisotropy in Evaporated Iron FilmsJournal of Applied Physics, 1959
- Dielectric Thin Films*Journal of the Optical Society of America, 1957
- Formation of Luminescent Films by EvaporationJournal of the Optical Society of America, 1957
- Elastic Moduli of Glasses at Elevated Temperatures by a Dynamic MethodJournal of the American Ceramic Society, 1956
- Stress Annealing in Copper FilmsJournal of Applied Physics, 1956
- Crystal growth and orientation in deposits condensed from the vapourActa Crystallographica, 1952
- Calculation of stress in electrodeposits from the curvature of a plated stripJournal of Research of the National Bureau of Standards, 1949