Dielectric function of amorphous silicon films, its oxidation and voids, studied by electron spectroscopy
- 1 March 1981
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 43 (2) , 153-164
- https://doi.org/10.1016/0022-3093(81)90115-0
Abstract
No abstract availableKeywords
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