TiO2 / SiO2 Multilayer Insulating Films for ELDs
- 1 April 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (4) , 1204-1206
- https://doi.org/10.1149/1.2069367
Abstract
Dielectric properties and the optical energy gap of multilayer films prepared by sputtering were measured. The thickness ratio, , was fixed at 1/3, and monolayer thickness, , was varied from 0.3 to 60 nm. The peak of the maximum charge density, which is the product of the dielectric constant and the breakdown field strength, was observed at . The optical energy gap was constant for , and increased as dropped below 2 nm. The films of are thought to be a composite whose contents vary periodically, and there is no bulk .Keywords
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