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Stress control in reactively sputtered AlN and TiN films
Home
Publications
Stress control in reactively sputtered AlN and TiN films
Stress control in reactively sputtered AlN and TiN films
GE
G. Este
G. Este
WW
W. D. Westwood
W. D. Westwood
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1 July 1987
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 5
(4)
,
1892-1897
https://doi.org/10.1116/1.574480
Abstract
No abstract available
Cited
Cited by 81 articles
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