Self-assembly: its use in at-the-surface imaging schemes for microstructure fabrication in resist films
- 1 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 259-262
- https://doi.org/10.1016/0167-9317(94)90150-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Resist schemes for soft x-ray lithographyPublished by SPIE-Intl Soc Optical Eng ,1991
- A Novel Photooxidative Scheme for Imaging at Polymer SurfacesPublished by SPIE-Intl Soc Optical Eng ,1989