Negative copper ion implantation into silica glasses at high dose rates and the optical measurements
- 1 May 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 127-128, 579-582
- https://doi.org/10.1016/s0168-583x(96)01132-9
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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