Optical and electrical properties of amorphous silicon films prepared by photochemical vapor deposition

15 April 1983

journal article
Published by AIP Publishing in Applied Physics Letters

Vol. 42 (8) , 678-679
https://doi.org/10.1063/1.94069

Abstract

Amorphous silicon films have been prepared through mercury-photosensitized decomposition of monosilane gas at low temperatures. The films show optical and electrical properties comparable with those of the best films prepared by plasma chemical vapor deposition. The feasibility of amorphous solar cells with short-circuit current densities of more than 10 mA/cm2 has been demonstrated by fabrication of a Schottky barrier structure.

Keywords

This publication has 3 references indexed in Scilit:

Structural interpretation of the vibrational spectra of $a$ -Si: H alloys
Physical Review B, 1979
Amorphous silicon solar cell
Applied Physics Letters, 1976
The ³P₁ Mercury-Photosensitized Decomposition of Monosilane
The Journal of Physical Chemistry, 1964