Interferometric characterization of the flexure-beam micromirror device

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Abstract
The flexure-beam micromirror device (FBMD) developed by Texas Instruments, Inc., is presently being considered for use in communication and imaging systems. This device consists of thousands of individually addressable micromirror elements with phase-mostly responses, greater than 70% active area, and response times of 10 microseconds. Accurate determination of individual mirror element amplitude and phase responses versus address voltage is important for understanding the effect this device will have in the various applications. an experimental setup based on a laser microscopic interferometric technique was used to precisely map the surface displacement of individual mirror elements as a function of address voltage. The test structure consisted of an 8 X 8 array of 25 X 25 micrometers square flexure-beam elements. A phase response of greater than 2(pi) radians at a wavelength of 632.8 nm was observed for address voltages ranging from 0 to 5.8 V. The phase versus voltage relationship is shown to be nonlinear.
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