Growth of Ultrasmooth Octadecyltrichlorosilane Self-Assembled Monolayers on SiO2
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- 17 January 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 19 (4) , 1159-1167
- https://doi.org/10.1021/la020697x
Abstract
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This publication has 37 references indexed in Scilit:
- Molecular patterning through high-resolution polymethylmethacrylate masksApplied Physics Letters, 2002
- A Protocol for the Reproducible Silanization of Mica Validated by Sum Frequency Spectroscopy and Atomic Force MicroscopyLangmuir, 2000
- Formation of Self-Assembled Octadecylsiloxane Monolayers on Mica and Silicon Surfaces Studied by Atomic Force Microscopy and Infrared SpectroscopyThe Journal of Physical Chemistry B, 1998
- Growth of Self-Assembled n-Alkyltrichlorosilane Films on Si(100) Investigated by Atomic Force MicroscopyLangmuir, 1995
- Binary self-assembled monolayers as prepared by successive adsorption of alkyltrichlorosilanesLangmuir, 1993
- Adsorption and scanning-tunneling-microscope imaging of benzene on graphite andPhysical Review Letters, 1993
- X-ray grazing incidence diffraction from alkylsiloxane monolayers on silicon wafersThe Journal of Chemical Physics, 1991
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989
- The structure of self-assembled monolayers of alkylsiloxanes on silicon: a comparison of results from ellipsometry and low-angle x-ray reflectivityJournal of the American Chemical Society, 1989
- Formation of multilayers by self-assemblyLangmuir, 1989