Resolution limits of optical methods for the defectinspection of lithography masks
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1) , 425-428
- https://doi.org/10.1016/0167-9317(89)90092-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- On Detecting EdgesIEEE Transactions on Pattern Analysis and Machine Intelligence, 1986
- Detecting Submicron Pattern Defects On Optical Photomasks Using An Enhanced El-3 Electron-Beam Lithography ToolPublished by SPIE-Intl Soc Optical Eng ,1982