Electron-shading characterization in a HDP contact etching process using a patterned CHARM wafer
- 7 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Plasma vacuum ultraviolet emission in a high density etcherPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Pattern-Dependent Charging and the Role of Electron TunnelingJapanese Journal of Applied Physics, 1998
- Plasma-charging damage: A physical modelJournal of Applied Physics, 1994