Photodetachment effect in a radio frequency plasma in CF4
- 18 December 1989
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (25) , 2597-2599
- https://doi.org/10.1063/1.101990
Abstract
Experiments to study negative ion densities have been carried out using the photodetachment effect in a rf plasma in CF4. Electrons are detached from the negative ions under the influence of the pulse of a Nd:YAG laser. The induced increase of the electron density is measured as a function of time using the shift of the resonance frequency of a microwave cavity containing the plasma. The negative ion density [F−] is found to be about (4±1)×1015 m−3, a factor 4±1 higher than the electron density.Keywords
This publication has 7 references indexed in Scilit:
- Numerical model of rf glow dischargesPhysical Review A, 1987
- Continuum modeling of argon radio frequency glow dischargesApplied Physics Letters, 1987
- Measurement of the photodetachment cross section of the negative ion of fluorinePhysical Review A, 1987
- Negative Ion Kinetics in RF Glow DischargesIEEE Transactions on Plasma Science, 1986
- Negative ion densities in NF3 dischargesApplied Physics Letters, 1984
- Limitations of the Microwave Cavity Method of Measuring Electron Densities in a PlasmaPhysical Review B, 1957
- Microwave ElectronicsReviews of Modern Physics, 1946