Rate controlling and composition analysis of alloy deposition processes by electron impact emission spectroscopy (EIES)

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Abstract
The technique of electron-impact emission spectroscopy (EIES) has been used to monitor and control the alloy deposition process. The multicomponent evaporant flux is allowed to pass through a sensor where it is excited by electron bombardement. Narrow-band optical filters are employed to select the specific emission line or lines from each component. At a specific electron-excitation energy, the emission intensity of the characteristic spectral lines from any constitutent is proportional to the number density of that constituent in the vapor flux. Experimental results on an aluminum–copper alloy system indicate that this technique has sufficient sensitivity and selectivity for most alloy deposition processes. EIES also offers several advantages over other existing monitoring techniques.

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