Single-Crystal Silicon Etching Characteristics Using Excimer Laser Cℓ₂ GAS

Publisher Website

1 January 1983

journal article
Published by Springer Nature in MRS Proceedings

Vol. 29
https://doi.org/10.1557/proc-29-167

Abstract

No abstract available

Keywords

This publication has 2 references indexed in Scilit:

Laser chemical technique for rapid direct writing of surface relief in silicon
Applied Physics Letters, 1981
Multiple photon excited SF6 interaction with silicon surfaces
The Journal of Chemical Physics, 1981