An apparatus for plasma anodization experiments
- 1 September 1974
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 45 (9) , 1119-1121
- https://doi.org/10.1063/1.1686823
Abstract
The design and operation of a unique apparatus for plasma anodization of bulk and vapor deposited metals is described. This apparatus made possible in one chamber vapor deposition of high purity metals on polished substrates, establishment of controlled glow discharges with various inert and reactive gases, and simultaneous ellipsometric and electrical measurements of the oxide films as they were being formed. The apparatus was also used for optical constant determinations at pressure of less than 1×10−10 Torr after evaporation of high purity metals.Keywords
This publication has 1 reference indexed in Scilit:
- Plasma Anodization of Metals and SemiconductorsJournal of Vacuum Science and Technology, 1970