Influence of thin film thickness variations on pattern fidelity of X-ray masks
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 61-65
- https://doi.org/10.1016/0167-9317(86)90030-4
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- E-beam metrology of chromium master masks and of masks for x-ray lithographyJournal of Vacuum Science & Technology B, 1985