A virtual slit for atom optics and nanolithography
- 1 June 1996
- journal article
- Published by IOP Publishing in Quantum and Semiclassical Optics: Journal of the European Optical Society Part B
- Vol. 8 (3) , 521-529
- https://doi.org/10.1088/1355-5111/8/3/015
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Light force cooling, focusing, and nanometer-scale deposition of aluminum atomsOptics Letters, 1995
- Microlithography by Using Neutral Metastable Atoms and Self-Assembled MonolayersScience, 1995
- Laser near rield lens for atomsJournal de Physique II, 1994
- Atomic Fresnel images and possible applications in atom lithographyJournal de Physique II, 1994
- Atom opticsPhysics Reports, 1994
- Laser-Focused Atomic DepositionScience, 1993
- Monte Carlo wave-function method in quantum opticsJournal of the Optical Society of America B, 1993
- Using light as a lens for submicron, neutral-atom lithographyPhysical Review Letters, 1992
- Monte Carlo simulation of the atomic master equation for spontaneous emissionPhysical Review A, 1992
- Wave-function approach to dissipative processes in quantum opticsPhysical Review Letters, 1992