Effects of Wafer Cleaning Reduction on Metals Removal and Ultrathin Gate Oxide Quality
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Dependence of thin-oxide films quality on surface microroughnessIEEE Transactions on Electron Devices, 1992