High rate deposition of SiO2 on large-scale glass by dc arc plasma enhanced CVD
- 1 November 1994
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 178, 215-219
- https://doi.org/10.1016/0022-3093(94)90287-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Optical emission investigation of the plasma enhanced chemical vapor deposition of silicon oxide filmsJournal of Vacuum Science & Technology A, 1992
- Optical emission and mass spectroscopic studies of the gas phase during the deposition of SiO2 and a-Si:H by remote plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1989
- Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1986