Compressive stress induced formation of cubic boron nitride
- 24 April 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (5-7) , 970-976
- https://doi.org/10.1016/0925-9635(93)90260-9
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Deposition of TiN, TiC, and TiO2 films by filtered arc evaporationSurface and Coatings Technology, 1991
- Electron optical characterization of cubic boron nitride thin films prepared by reactive ion platingJournal of Applied Physics, 1991
- Properties of tetrahedral amorphous carbon prepared by vacuum arc depositionDiamond and Related Materials, 1991
- Compressive-stress-induced formation of thin-film tetrahedral amorphous carbonPhysical Review Letters, 1991
- Intrinsic stress in sputtered thin filmsJournal of Vacuum Science & Technology A, 1991
- The synthesis of cubic BN films using a hot cathode plasma discharge in a parallel magnetic fieldSurface and Coatings Technology, 1990
- Stress state of chromium nitride films deposited by reactive direct current planar magnetron sputteringJournal of Vacuum Science & Technology A, 1990
- Structure and hardness of diamond-like carbon films prepared by arc evaporationJournal of Materials Science Letters, 1988
- Effect of ion bombardment during deposition on thick metal and ceramic depositsJournal of Vacuum Science and Technology, 1974
- Direct Transformation of Hexagonal Boron Nitride to Denser FormsThe Journal of Chemical Physics, 1963