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Properties of SiO2 Grown in the Presence of HCl or Cl2
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Properties of SiO2 Grown in the Presence of HCl or Cl2
Properties of SiO2 Grown in the Presence of HCl or Cl2
YM
Y. J. van der Meulen
Y. J. van der Meulen
CO
C. M. Osburn
C. M. Osburn
JZ
J. F. Ziegler
J. F. Ziegler
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1 February 1975
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 122
(2)
,
284-290
https://doi.org/10.1149/1.2134196
Abstract
No abstract available
Cited
Cited by 43 articles
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