Investigation of the early stages of diamond film growth by ellipsometric monitoring
- 31 December 1992
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 54-55, 414-417
- https://doi.org/10.1016/s0257-8972(07)80058-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- In-process ellipsometric monitoring of diamond film growth by microwave plasma enhanced chemical vapor depositionApplied Physics Letters, 1992
- Ellipsometric monitor for process controlApplied Optics, 1989
- Growth of diamond thin films by dc plasma chemical vapor depositionApplied Physics Letters, 1987
- Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen SubstanzenAnnalen der Physik, 1935