A color vision system for microelectronics: Application to oxide thickness measurements

1 January 1986

conference paper
Published by Institute of Electrical and Electronics Engineers (IEEE)

Vol. 3, 1242-1247
https://doi.org/10.1109/robot.1986.1087565

Abstract

We present a new method of automated inspection of microelectronic structures. The method is based on color rather than black and white vision, and is a first such application of color vision to inspection for microelectronics fabrication. We describe the general method and demonstrate its practical implementation in the measurement of oxide thicknesses. A key result of this work is to have established sensitivity criteria for color detection in microelectronic structures. The resolution achieved allows us to measure differences in oxide thickness to approximately 30 Angstroms or better. By using the Ohta coordinates, our system can discrimimate between cyclically repeating hues. This determination can be done very rapidly (approximately 100 milliseconds) and does not require a complex (and thus expensive) computer system. An additional advantage of our method is the possibility of more easily and flexibly performing oxide thickness measurements in situ, than can be accomplished with standard techniques, such as ellipsometry.

Keywords

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