Secondary ion emission from clean and K-covered Ni surfaces near threshold impact energies
- 1 December 1994
- journal article
- Published by Elsevier in Surface Science
- Vol. 320 (3) , L76-L80
- https://doi.org/10.1016/0039-6028(94)90301-8
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Interactions of low energy (10–600 eV) noble gas ions with a graphite surface: surface penetration, trapping and self-sputtering behaviorsPublished by Elsevier ,2002
- Charge state of potassium on metal and semiconductor surfaces studied by low-energyscatteringPhysical Review Letters, 1992
- Influence of the primary ion charge state on secondary ion production: bombardment of CO/Ni(111) with Ne+ Ne2+ Kr+ and Kr2+ at low impact energiesSurface Science, 1991
- Cross sections for sputtering of p(2 × 2) oxygen on Ni(111) by 5–200 eV Ne+Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Auger neutralization of multiply charged noble gas ions at a tungsten surfaceSurface Science, 1982
- Sputtering of chemisorbed gas (nitrogen on tungsten) by low-energy ionsJournal of Applied Physics, 1974
- Sputtering Yields at Very Low Bombarding Ion EnergiesJournal of Applied Physics, 1962
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961
- Low-Energy Sputtering Yields in HgPhysical Review B, 1958
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957