Mask making for synchrotron radiation lithography
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 463-470
- https://doi.org/10.1016/0167-9317(86)90078-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986
- Influence of absorber stress on the precision of x-ray masksJournal of Vacuum Science & Technology B, 1986