Application of Total Reflection X-Ray Fluorescence Analysis for Metallic Trace Impurities on Silicon Wafer Surfaces
- 1 January 1989
- book chapter
- Published by ASTM International
- p. 305-313
- https://doi.org/10.1520/stp26047s
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Grazing incidence X-ray fluorescence analysisNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1986
- Determination of trace elements in rainwater by total-reflection x-ray fluorescenceAnalytical Chemistry, 1985
- Instrumental Neutron Activation Analysis of Processed SiliconJournal of the Electrochemical Society, 1985