Magnetic and structural properties of permalloy-tantalum multilayer thin films
- 15 April 1991
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 69 (8) , 4526-4528
- https://doi.org/10.1063/1.348348
Abstract
This work describes a detailed investigation into the magnetic and structural properties of permalloy-tantalum multilayered thin films produced by vacuum evaporation. Their microstructure was investigated using high-resolution TEM and the magnetic properties were measured with vibrating-sample and vibrating-reed magnetometers. The results show a reduction in coercivity for the multilayer films which is independent of the number of layers but depends strongly on the magnetic layer thickness. The tantalum layer is shown to be continuous and microcrystalline down to 25-Å thickness, but the interface between the layers is irregular and may give rise to additional magnetostatic coupling as the tantalum layer thickness is reduced.This publication has 3 references indexed in Scilit:
- Reaction between permalloy and several thin metal filmsThin Solid Films, 1984
- Magnetic domain structures in multilayered NiFe filmsJournal of Applied Physics, 1979
- Domain-Wall Structures in Magnetic Double FilmsJournal of Applied Physics, 1966