Application of wet chemical selective etch techniques to the fabrication of thin silicon detectors
- 1 March 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
- Vol. 326 (1-2) , 21-26
- https://doi.org/10.1016/0168-9002(93)90328-f
Abstract
No abstract availableKeywords
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- Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped SiliconJournal of the Electrochemical Society, 1971
- Electrochemically Controlled Thinning of SiliconBell System Technical Journal, 1970