Sub-10-nm-Scale Lithography Usingp-chloromethyl-methoxy-calix[4]arene Resist

• 30 June 2003
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 42  (Part 1, No) , 3913-3916
• https://doi.org/10.1143/jjap.42.3913

Abstract

Keywords

• HIGH RESOLUTION
• CALIXARENE
• LITHOGRAPHY
• RESIST
• ELECTRON BEAM