Line‐Profile resist development simulation techniques
- 1 June 1977
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 17 (6) , 381-384
- https://doi.org/10.1002/pen.760170610
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975