E-beam direct wafer writing process using a water-soluble conductive layer
- 1 March 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 36 (3) , 474-478
- https://doi.org/10.1109/16.19956
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Electron-beam lithography for small MOSFET'sIEEE Transactions on Electron Devices, 1981