Diffusion of Silicon and Phosphorus into Germanium as Studied by Secondary Ion Mass Spectrometry
- 1 January 1997
- journal article
- Published by Trans Tech Publications, Ltd. in Defect and Diffusion Forum
- Vol. 143-147, 1053-1058
- https://doi.org/10.4028/www.scientific.net/ddf.143-147.1053
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