Fluorine Pressure Change Monitor for a Reacting System

Abstract
Recent experimental results on the performance of a pulsed HF chemical laser have indicated that the presence of HF in the chemical reactants prior to laser initiation degrades the laser performance. In order to monitor the amount of HF produced when the chemical reactants are mixed, a device has been developed that measures the change in concentration of one of the reactants. This device, which relies on the absorption of light by molecular F2, has been shown to have an accuracy of better than 5% in the measurement of the F2 pressure.

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