The effect of target-substrate coupling on reactive direct current magnetron sputtering
- 1 December 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 39-40, 549-564
- https://doi.org/10.1016/s0257-8972(89)80016-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheresJournal of Vacuum Science & Technology A, 1984
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- High rate sputtering techniquesThin Solid Films, 1981