Chemical vapour deposition of boron carbides in the temperature range 1300–1500 K and at a reduced pressure
- 1 February 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 124 (2) , 101-107
- https://doi.org/10.1016/0040-6090(85)90251-2
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Composition and structural changes of boron carbides deposited by chemical vapour deposition under various conditions of temperature and supersaturationJournal of the Less Common Metals, 1981
- The properties and structure of the boron carbide phaseJournal of the Less Common Metals, 1981
- Analytical investigations in the BC systemJournal of the Less Common Metals, 1981
- On the existence of tetragonal boron and the crystal structures of B50C2 and B50N2: an x-ray diffraction analysisZeitschrift für Kristallographie - Crystalline Materials, 1975
- Composition and structure of boron carbides prepared by CVDJournal of Crystal Growth, 1974
- Das B-C-system im kinetischen bildungsbereich: Pyrolytische bildung kohlenstoffreicher B-C-PhasenJournal of the Less Common Metals, 1971