Mechanism of Fermi-level stabilization in semiconductors
- 15 March 1988
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 37 (9) , 4760-4763
- https://doi.org/10.1103/physrevb.37.4760
Abstract
A striking correlation between the Fermi level in heavily radiation damaged semiconductors and at metal-semiconductor interfaces is presented. The correlation provides critical evidence supporting the defect model for Schottky-barrier formation. The Fermi-level energy for both situations corresponds to the average energy of the hybrid. In the case of GaAs, a detailed description of the Fermi-level stabilization caused by amphoteric dangling-bond-like defects is given.
Keywords
This publication has 16 references indexed in Scilit:
- Metal-derived band gap states: Ti on GaAs(110)Journal of Vacuum Science & Technology A, 1986
- Schottky barrier formation on iii-v semiconductor surfaces: A critical evaluationCritical Reviews in Solid State and Materials Sciences, 1986
- Electronic Structure, Total Energies, and Abundances of the Elementary Point Defects in GaAsPhysical Review Letters, 1985
- Schottky Barrier Heights and the Continuum of Gap StatesPhysical Review Letters, 1984
- On the electrical properties of compound semiconductor interfaces in metal/insulator/ semiconductor structures and the possible origin of interface statesThin Solid Films, 1983
- Schottky barriers: An effective work function modelApplied Physics Letters, 1981
- Unified Mechanism for Schottky-Barrier Formation and III-V Oxide Interface StatesPhysical Review Letters, 1980
- Electronic structure of a metal-semiconductor interfacePhysical Review B, 1976
- Theory of Surface StatesPhysical Review B, 1965
- Surface States and Rectification at a Metal Semi-Conductor ContactPhysical Review B, 1947