Fine structure in the field effect mobility of MOS transistors
- 1 August 1976
- journal article
- Published by Elsevier in Surface Science
- Vol. 58 (1) , 56-59
- https://doi.org/10.1016/0039-6028(76)90112-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Admittance studies of surface quantization in [100]-oriented Si metal-oxide-semiconductor field-effect transistorsPhysical Review B, 1974
- Peaked structure in field-effect mobility of silicon MOS transistors at very low temperaturesApplied Physics Letters, 1973
- Properties of Semiconductor Surface Inversion Layers in the Electric Quantum LimitPhysical Review B, 1967