Negative and Positive Tone Protein Patterning on E-Beam/Deep-UV Resists
- 1 May 1999
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 15 (11) , 3845-3851
- https://doi.org/10.1021/la980914n
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Micron-Sized Protein Patterning on Diazonaphthoquinone/Novolak Thin Polymeric FilmsLangmuir, 1998
- The influence of protein and interfacial structure on the self-assembly of oriented protein arraysAdvances in Biophysics, 1997
- Photo-patterning of sensor surfaces with biomolecular structures: characterisation using AFM and fluorescence microscopyBiosensors and Bioelectronics, 1995
- Micron‐Scale Patterning of Biological MoleculesAngewandte Chemie International Edition in English, 1995
- Applications of Combinatorial Technologies to Drug Discovery. 1. Background and Peptide Combinatorial LibrariesJournal of Medicinal Chemistry, 1994
- New approach to producing patterned biomolecular assembliesJournal of the American Chemical Society, 1992
- Development of molecular patterning and immobilization techniques for scanning tunnelling microscopy and atomic force microscopyNanotechnology, 1991
- Light-Directed, Spatially Addressable Parallel Chemical SynthesisScience, 1991
- Poly(methacrylic anhydride) positive electron beam resistJournal of Vacuum Science & Technology B, 1989
- Electron Resists for Microcircuit and Mask ProductionJournal of the Electrochemical Society, 1969