A new reactive pulsed laser ablation technique for the deposition of hard carbon and carbon-nitride thin films
- 1 April 1999
- journal article
- Published by Elsevier in Materials Letters
- Vol. 39 (2) , 97-102
- https://doi.org/10.1016/s0167-577x(98)00223-7
Abstract
No abstract availableKeywords
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