FT-IR characterization of silicon nitride Si3N4 and silicon oxynitride Si2ON2 surfaces
- 1 March 1986
- journal article
- Published by Elsevier in Journal of Molecular Structure
- Vol. 143, 525-528
- https://doi.org/10.1016/0022-2860(86)85316-9
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Infrared Characterization of α‐ and β‐Crystalline Silicon NitrideJournal of the Electrochemical Society, 1983
- Investigation of proton-acceptor properties of oxide surfaces by IR spectroscopy of hydrogen-bonded complexesReaction Kinetics, Mechanisms and Catalysis, 1979
- Infrared study of low temperature adsorption. 1. Carbon monoxide on aerosil. An interpretation of the hydrated silica spectrumThe Journal of Physical Chemistry, 1979
- Infrared Study of OH and NH2 Groups on the Surface of a Dry Silica AerogelThe Journal of Physical Chemistry, 1966